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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Polo Trasancos, Ma. del Carmen |
dc.contributor.author | Peiró Martínez, Francisca |
dc.contributor.author | Cifre, J. |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Puigdollers i González, Joaquim |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.date | 2016-06-08T13:59:59Z |
dc.date | 2016-06-08T13:59:59Z |
dc.date | 1995 |
dc.date | 2016-06-08T14:00:04Z |
dc.identifier.citation | 0951-3248 |
dc.identifier.citation | 119500 |
dc.identifier.uri | http://hdl.handle.net/2445/99362 |
dc.format | 4 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Institute of Physics (IOP) |
dc.relation | Reproducció del document publicat a: http://iopscience.iop.org/journal/1742-6596 |
dc.relation | Institute of Physics Conference Series, 1995, vol. 146, p. 503-506 |
dc.rights | cc-by (c) Polo Trasancos, Ma. del Carmen et al., 1995 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.rights | http://creativecommons.org/licenses/by/3.0/es |
dc.subject | Silici |
dc.subject | Deposició química en fase vapor |
dc.subject | Pel·lícules fines |
dc.subject | Creixement cristal·lí |
dc.subject | Silicon |
dc.subject | Chemical vapor deposition |
dc.subject | Thin films |
dc.subject | Crystal growth |
dc.title | Crystal growth characterization of polycrystalline silicon films obtained by hot-wire chemical vapour deposition |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.description.abstract |