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Degradation of thin tungsten filaments at high temperature in HWCVD
Frigeri, Paolo Antonio; Nos Aguilà, Oriol; Bertomeu i Balagueró, Joan
Universitat de Barcelona
The degradation of the filaments is usually studied by checking the silicidation or carbonization status of the refractory metal used as catalysts, and their effects on the structural stability of the filaments. In this paper, it will be shown that the catalytic stability of a filament heated at high temperature is much shorter than its structural lifetime. The electrical resistance of a thin tungsten filament and the deposition rate of the deposited thin film have been monitored during the filament aging. It has been found that the deposition rate drops drastically once the quantity of dissolved silicon in the tungsten reaches the solubility limit and the silicides start precipitating. This manuscript concludes that the catalytic stability is only guaranteed for a short time and that for sufficiently thick filaments it does not depend on the filament radius.
Tungstè
Deposició química en fase vapor
Silici
Catàlisi
Pel·lícules fines
Tungsten
Chemical vapor deposition
Silicon
Catalysis
Thin films
(c) Elsevier B.V., 2015
Article
info:eu-repo/semantics/acceptedVersion
Elsevier B.V.
         

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