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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Asensi López, José Miguel |
dc.contributor.author | Puigdollers i González, Joaquim |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.contributor.author | Morenza Gil, José Luis |
dc.date | 2013-11-08T07:50:21Z |
dc.date | 2013-11-08T07:50:21Z |
dc.date | 1993 |
dc.date | 2013-11-08T07:50:21Z |
dc.identifier.citation | 0042-207X |
dc.identifier.citation | 070216 |
dc.identifier.uri | http://hdl.handle.net/2445/47603 |
dc.format | 23 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Elsevier Ltd |
dc.relation | Versió postprint del document publicat a: http://dx.doi.org/10.1016/0042-207X(93)90361-D |
dc.relation | Vacuum, 1993, vol. 44, num. 2, p. 129-134 |
dc.relation | http://dx.doi.org/10.1016/0042-207X(93)90361-D |
dc.rights | (c) Elsevier Ltd, 1993 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Silici |
dc.subject | Semiconductors amorfs |
dc.subject | Cèl·lules solars |
dc.subject | Pel·lícules fines |
dc.subject | Transistors |
dc.subject | Nanotecnologia |
dc.subject | Deposició química en fase vapor |
dc.subject | Silicon |
dc.subject | Amorphous semiconductors |
dc.subject | Solar cells |
dc.subject | Thin films |
dc.subject | Transistors |
dc.subject | Nanotechnology |
dc.subject | Chemical vapor deposition |
dc.title | Structure of a-Si:H/a-Si1-xCx:H multilayers deposited in a reactor with automated substrate holder |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/acceptedVersion |
dc.description.abstract |