Para acceder a los documentos con el texto completo, por favor, siga el siguiente enlace: http://hdl.handle.net/2445/47367
dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Soler i Vilamitjana, David |
dc.contributor.author | Fonrodona Turon, Marta |
dc.contributor.author | Voz Sánchez, Cristóbal |
dc.contributor.author | Asensi López, José Miguel |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.date | 2013-10-29T12:47:52Z |
dc.date | 2013-10-29T12:47:52Z |
dc.date | 2003 |
dc.date | 2013-10-29T12:47:52Z |
dc.identifier.citation | 0040-6090 |
dc.identifier.citation | 507389 |
dc.identifier.uri | http://hdl.handle.net/2445/47367 |
dc.format | 13 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Elsevier B.V. |
dc.relation | Versió postprint del document publicat a: http://dx.doi.org/10.1016/S0040-6090(03)00095-6 |
dc.relation | Thin Solid Films, 2003, vol. 430, num. 1-2, p. 157-160 |
dc.relation | http://dx.doi.org/10.1016/S0040-6090(03)00095-6 |
dc.rights | (c) Elsevier B.V., 2003 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Deposició química en fase vapor |
dc.subject | Catàlisi |
dc.subject | Silici |
dc.subject | Nanocristalls |
dc.subject | Cèl·lules solars |
dc.subject | Pel·lícules fines |
dc.subject | Propietats elèctriques |
dc.subject | Chemical vapor deposition |
dc.subject | Catalysis |
dc.subject | Silicon |
dc.subject | Nanocrystals |
dc.subject | Solar cells |
dc.subject | Thin films |
dc.subject | Electric properties |
dc.title | Substrate influence on the properties of doped thin silicon layers grown by Cat-CVD |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/acceptedVersion |
dc.description.abstract |