Title: | Breakdown-induced negative charge in ultrathin SiO2 films measured by atomic force microscopy |
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Author: | Porti i Pujal, Marc; Nafría i Maqueda, Montserrat; Blüm, M. C.; Aymerich Humet, Xavier; Sadewasser, S.; American Physical Society |
Abstract: | |
Subject(s): | -Charged currents -Thin film devices -Atomic force microscopy -Dielectric breakdown -Dielectric devices -Dielectric thin films -Metal insulator semiconductor structures -Metallic thin films -Physics demonstrations -Thin films |
Rights: | open access
Tots els drets reservats. https://rightsstatements.org/vocab/InC/1.0/ |
Document type: | Article |
Published by: | |
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Uri: | https://ddd.uab.cat/record/116259 |