Electrodeposition of CoNi alloys in a biocompatible DES and its suitability for activating the formation of sulfate radicals

Data de publicació

2023-02-03T16:01:28Z

2023-02-03T16:01:28Z

2022-10-23

2023-02-03T16:01:28Z

Resum

Building a sustainable future requires new, accessible, economic, and ecological methods of preparing nanostructured materials used in biomedical and environmental applications. In this work, a detailed study on the electrodeposition process of CoNi in a biocompatible deep eutectic solvent (DES) is presented. Alloy plating performed in choline chloride within a urea-based DES allowed us to tailor elemental compositions, morphologies, and size of the deposits based on the plating conditions. Homogeneous, continuous, and needle-shaped deposits were characterized using electrochemical methods and ex-situ characterization techniques. Although the process's electrochemical behavior corresponded to that of normal deposition, applying the most negative potentials produced a co-reduction of the solvent, which favored the incorporation of oxygen species into the deposit. Given the materials' nature, morphology, and composition tailored to the high active surface, the materials were tested as platforms to activate the formation of sulfate radicals from the peroxomonosulfate salt. Results related to the proposed material and preparation method were promising, as, confirmed by the high effectiveness in degrading the antibiotic tetracycline. Altogether, the work showcases a versatile, environmentally friendly route for electrodepositing CoNi in DESs to yield a proactive tool for developing of platforms with catalytic potential.

Tipus de document

Article


Versió publicada

Llengua

Anglès

Publicat per

Elsevier Ltd

Documents relacionats

Reproducció del document publicat a: https://doi.org/10.1016/j.electacta.2022.141428

Electrochimica Acta, 2022, vol. 435, p. 141428-141428-11

https://doi.org/10.1016/j.electacta.2022.141428

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cc-by-nc-nd (c) Gómez, Elvira et al., 2022

https://creativecommons.org/licenses/by-nc-nd/4.0/

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