Simulation of STEM-HAADF image contrast of Ruddlesden-Popper faulted LaNiO<sub>3</sub> thin films

Resumen

LaNiO3 (LNO) thin films are widely used as electrode materials. Yet, their properties greatly depend on such parameters as strain state and defect density. In this work we present a detailed structural characterization of epitaxial LNO thin films grown on LaAlO3(001). Based on scanning transmission electron microscope - high-angle annular darkfield imaging (STEM-HAADF) contrast analysis and image simulations, Ruddlesden-Popper faulted configurations, with 1/2a<111> relative displacement of defect free perovskite blocks, are atomically modeled and simulated to disentangle the variation of Z-contrast in the experimental images

Tipo de documento

Artículo


Versión aceptada

Lengua

Inglés

Materias y palabras clave

Pel·lícules fines; Thin films

Publicado por

American Chemical Society

Documentos relacionados

Versió postprint del document publicat a: https://doi.org/10.1021/acs.jpcc.6b12484

Journal of Physical Chemistry C, 2017, vol. 121, num. 17, p. 9300-9304

https://doi.org/10.1021/acs.jpcc.6b12484

Citación recomendada

Esta citación se ha generado automáticamente.

Derechos

(c) American Chemical Society , 2017