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dc.contributor | Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica |
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dc.contributor | Universitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies |
dc.contributor.author | von Gastrow, Guillaume |
dc.contributor.author | Alcubilla González, Ramón |
dc.contributor.author | Ortega Villasclaras, Pablo Rafael |
dc.contributor.author | Yli-Koski, Marko |
dc.contributor.author | Conesa-Boj, Sònia |
dc.contributor.author | Fontcuberta i Morral, Anna |
dc.contributor.author | Savin, Hele |
dc.date | 2015-11 |
dc.identifier.citation | von Gastrow, G., Alcubilla, R., Ortega, P., Yli-Koski, M., Conesa-Boj, S., Fontcuberta i Morral, A., Savin, H. Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon. "Solar energy materials and solar cells", Novembre 2015, vol. 142, p. 29-33. |
dc.identifier.citation | 0927-0248 |
dc.identifier.citation | 10.1016/j.solmat.2015.05.027 |
dc.identifier.uri | http://hdl.handle.net/2117/84498 |
dc.language.iso | eng |
dc.relation | http://ac.els-cdn.com/S0927024815002329/1-s2.0-S0927024815002329-main.pdf?_tid=b5171b34-b867-11e5-bb28-00000aacb35d&acdnat=1452519306_b99682dcae364207f0138f2c6a478c74 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.rights | http://creativecommons.org/licenses/by-nc-nd/3.0/es/ |
dc.subject | Àrees temàtiques de la UPC::Energies::Energia solar fotovoltaica |
dc.subject | Photovoltaic power generation |
dc.subject | Nano-texturing |
dc.subject | Surface passivation |
dc.subject | Reactive ion etching |
dc.subject | Negative charge |
dc.subject | Al2O3 |
dc.subject | Atomic Layer Deposition |
dc.subject | Energia solar fotovoltaica |
dc.title | Analysis of the Atomic Layer Deposited Al2O3 field-effect passivation in black silicon |
dc.type | info:eu-repo/semantics/submittedVersion |
dc.type | info:eu-repo/semantics/article |
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