Growth and physical properties of highly oriented La-doped (K,Na)NbO3 ferroelectric thin films

Other authors

Universitat Politècnica de Catalunya. Departament de Física Aplicada

Universitat Politècnica de Catalunya. CEMAD - Caracterització Elèctrica de Materials i Dispositius

Publication date

2015-02-27

Abstract

Lead-free (K,Na)NbO3 (KNN) and La doped (K,Na)NbO3 (KNN-La) thin films are grown on SrTiO3 substrates using the chemical solution deposition method. The effect of adding different amounts of Na and K excess (0-20 mol%) is investigated. The results confirm the necessity of adding 20 mol% excess amounts of Na and K precursor solutions in order to avoid the formation of the secondary phase, K4Nb6O17, as confirmed by X-ray diffraction and Raman spectroscopy. Moreover, when adding a 20 mol% of alkaline metal excess, the thin films are highly textured with out-of-plane preferential orientation in the [100] direction of the [100] orientation of the substrate. Doping with lanthanum results in a decrease of the leakage current density at low electric field, and an increase in the dielectric permittivity across the whole temperature range (80-380 K). Although the (100)-oriented KNN and KNN-La films exhibited rounded hysteresis loops, at low temperatures the films show the typical ferroelectric hysteresis loops. (C) 2015 Elsevier B.V. All rights reserved.


Postprint (author’s final draft)

Document Type

Article

Language

English

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http://www.sciencedirect.com/science/article/pii/S0040609015000723

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Rights

http://creativecommons.org/licenses/by-nc-nd/3.0/es/

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Attribution-NonCommercial-NoDerivs 3.0 Spain

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E-prints [72986]