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V2Ox-based hole-selective contacts for c-Si interdigitated back-contacted solar cells
Masmitjà Rusiñol, Gerard; Gerling Sarabia, Luis Guillermo; Ortega Villasclaras, Pablo Rafael; Puigdollers i González, Joaquim; Martín García, Isidro; Voz Sánchez, Cristóbal; Alcubilla González, Ramón
Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica; Universitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies
Over the last few years, transition metal oxide layers have been proposed as selective contacts both for electrons and holes and successfully applied to silicon solar cells. However, better published results need the use of both a thin and high quality intrinsic amorphous Si layer and TCO (Transparent Conductive Oxide) films. In this work, we explore the use of vanadium suboxide (V2Ox) capped with a thin Ni layer as a hole transport layer trying to avoid both the intrinsic amorphous silicon layer and the TCO contact layer. Obtained figures of merit for Ni/V2Ox/c-Si(n) test samples are saturation current densities of 175 fA cm-2 and specific contact resistance below 115 mO cm2 on 40 nm thick V2Ox layers. Finally, the Ni/V2Ox stack is used with an interdigitated back-contacted c-Si(n) solar cell architecture fully fabricated at low temperatures. An open circuit voltage, a short circuit current and a fill factor of 656 mV, 40.7 mA cm-2 and 74.0% are achieved, respectively, leading to a power conversion efficiency of 19.7%. These results confirm the high potential of Ni/V2Ox stacks as hole-selective contacts on crystalline silicon photovoltaics.
Peer Reviewed
Àrees temàtiques de la UPC::Enginyeria electrònica::Microelectrònica
Àrees temàtiques de la UPC::Energies::Energia solar fotovoltaica::Cèl·lules solars
Solar cells
Transition metal oxide layers
TCO
Transparent conductive oxide
Vanadium suboxide
V2Ox
Ni/V2Ox
Crystalline silicon photovoltaics
Cèl·lules solars
info:eu-repo/semantics/publishedVersion
Artículo
Royal Society of Chemistry
         

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