We propose the subwavelength localization via adiabatic passage (SLAP) technique to coherently achieve state-selective patterning of matter waves well beyond the diffraction limit. The SLAP technique consists in coupling two partially overlapping and spatially structured laser fields to three internal levels of the matter wave yielding state-selective localization at those positions where the adiabatic passage process does not occur. We show that by means of this technique matter wave localization down to the single nanometer scale can be achieved. We analyze in detail the potential implementation of the SLAP technique for nanolithography with an atomic beam of metastable Ne∗ and for coherent patterning of a two-component R87b Bose-Einstein condensate.