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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Puigdollers i González, Joaquim |
dc.contributor.author | Cifre, J. |
dc.contributor.author | Polo Trasancos, Ma. del Carmen |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.contributor.author | Lloret, A. |
dc.date | 2016-05-23T13:57:34Z |
dc.date | 2016-05-23T13:57:34Z |
dc.date | 1995 |
dc.date | 2016-05-12T13:00:16Z |
dc.identifier.citation | 0169-4332 |
dc.identifier.citation | 095707 |
dc.identifier.uri | http://hdl.handle.net/2445/98758 |
dc.format | 4 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Elsevier B.V. |
dc.relation | Versió postprint del document publicat a: http://dx.doi.org/10.1016/0169-4332(94)00420-X |
dc.relation | Applied Surface Science, 1995, vol. 86, num. 1-4, p. 600-603 |
dc.relation | http://dx.doi.org/10.1016/0169-4332(94)00420-X |
dc.rights | (c) Elsevier B.V., 1995 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Deposició química en fase vapor |
dc.subject | Pel·lícules fines |
dc.subject | Silici |
dc.subject | Chemical vapor deposition |
dc.subject | Thin films |
dc.subject | Silicon |
dc.title | P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/acceptedVersion |
dc.description.abstract |