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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Dosev, D. |
dc.contributor.author | Puigdollers i González, Joaquim |
dc.contributor.author | Orpella, Albert |
dc.contributor.author | Voz Sánchez, Cristóbal |
dc.contributor.author | Fonrodona Turon, Marta |
dc.contributor.author | Soler Vilamitjana, David |
dc.contributor.author | Marsal Garví, Lluís F. (Lluís Francesc) |
dc.contributor.author | Pallarés Curto, Jordi |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.contributor.author | Alcubilla González, Ramón |
dc.date | 2016-05-06T15:32:56Z |
dc.date | 2016-05-06T15:32:56Z |
dc.date | 2001 |
dc.date | 2016-05-06T15:33:01Z |
dc.identifier.citation | 0040-6090 |
dc.identifier.citation | 160001 |
dc.identifier.uri | http://hdl.handle.net/2445/98400 |
dc.format | 3 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Elsevier B.V. |
dc.relation | Versió postprint del document publicat a: http://dx.doi.org/10.1016/S0040-6090(00)01608-4 |
dc.relation | Thin Solid Films, 2001, vol. 383, num. 1-2, p. 307-309 |
dc.relation | http://dx.doi.org/10.1016/S0040-6090(00)01608-4 |
dc.rights | (c) Elsevier B.V., 2001 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Pel·lícules fines |
dc.subject | Silici |
dc.subject | Estabilitat |
dc.subject | Semiconductors |
dc.subject | Deposició química en fase vapor |
dc.subject | Thin films |
dc.subject | Silicon |
dc.subject | Stability |
dc.subject | Semiconductors |
dc.subject | Chemical vapor deposition |
dc.title | Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/acceptedVersion |
dc.description.abstract |