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dc.contributor.author | Roura Grabulosa, Pere |
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dc.contributor.author | Farjas Silva, Jordi |
dc.date | 2006 |
dc.date.accessioned | 2013-11-12T23:15:58Z |
dc.date.available | 2013-11-12T23:15:58Z |
dc.date.issued | 2013-11-12T23:15:58Z |
dc.identifier.citation | 1098-0121 (versió paper) |
dc.identifier.citation | 1550-235X (versió electrònica) |
dc.identifier.citation | http://dx.doi.org/10.1103/PhysRevB.74.127301 |
dc.identifier.uri | http://hdl.handle.net/10256/8574 |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | American Physical Society |
dc.relation | Reproducció digital del document publicat a: http://dx.doi.org/10.1103/PhysRevB.74.127301 |
dc.relation | © Physical Review B, 2006, vol. 74, núm. 12, p. 127301 |
dc.relation | Articles publicats (D-F) |
dc.rights | Tots els drets reservats |
dc.subject | Silici -- Oxidació |
dc.subject | Silicon -- Oxidation |
dc.title | Comment on “Dynamics of thermal growth of silicon oxide films on Si” |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.description.abstract |