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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Saboundji, A. |
dc.contributor.author | Coulon, N. |
dc.contributor.author | Gorin, A. |
dc.contributor.author | Lhermite, H. |
dc.contributor.author | Mohammed-Brahim, T. |
dc.contributor.author | Fonrodona Turon, Marta |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.date | 2013-10-31T12:21:25Z |
dc.date | 2013-10-31T12:21:25Z |
dc.date | 2005 |
dc.date | 2013-10-31T12:21:25Z |
dc.identifier.citation | 0040-6090 |
dc.identifier.citation | 525190 |
dc.identifier.uri | http://hdl.handle.net/2445/47424 |
dc.format | 6 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Elsevier B.V. |
dc.relation | Versió postprint del document publicat a: http://dx.doi.org/10.1016/j.tsf.2005.01.070 |
dc.relation | Thin Solid Films, 2005, vol. 487, num. 1-2, p. 227-231 |
dc.relation | http://dx.doi.org/10.1016/j.tsf.2005.01.070 |
dc.rights | (c) Elsevier B.V., 2005 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Transistors |
dc.subject | Semiconductors |
dc.subject | Silici |
dc.subject | Temperatures baixes |
dc.subject | Transistors |
dc.subject | Semiconductors |
dc.subject | Silicon |
dc.subject | Low temperatures |
dc.title | Top-gate microcrystalline silicon TFTs processed at low temperature (<200ºC) |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/acceptedVersion |
dc.description.abstract |