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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Antony, Aldrin |
dc.contributor.author | Carreras Seguí, Paz |
dc.contributor.author | Keitzl, Thomas |
dc.contributor.author | Roldán, Rubén |
dc.contributor.author | Nos Aguilà, Oriol |
dc.contributor.author | Frigeri, Paolo Antonio |
dc.contributor.author | Asensi López, José Miguel |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.date | 2013-10-18T07:31:42Z |
dc.date | 2019-11-01T06:10:12Z |
dc.date | 2010 |
dc.date | 2013-10-18T07:21:50Z |
dc.identifier.citation | 1862-6300 |
dc.identifier.citation | 574337 |
dc.identifier.uri | http://hdl.handle.net/2445/47124 |
dc.format | 4 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Wiley-VCH |
dc.relation | Versió preprint del document publicat a: http://dx.doi.org/10.1002/pssa.200983765 |
dc.relation | physica status solidi (a), 2010, vol. 207, num. 7, p. 1577-1580 |
dc.relation | http://dx.doi.org/10.1002/pssa.200983765 |
dc.rights | (c) Wiley-VCH, 2010 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Òxids metàl·lics |
dc.subject | Optoelectrònica |
dc.subject | Metall-òxid-semiconductors |
dc.subject | Pel·lícules fines |
dc.subject | Cèl·lules fotoelèctriques |
dc.subject | Metallic oxides |
dc.subject | Optoelectronics |
dc.subject | Metal oxide semiconductors |
dc.subject | Thin films |
dc.subject | Photoelectric cells |
dc.title | Influence of RF power on the properties of sputtered ZnO:Al thin films |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/submittedVersion |
dc.description.abstract |