To access the full text documents, please follow this link: http://hdl.handle.net/2445/33305
dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Prtljaga, Nikola |
dc.contributor.author | Navarro Urrios, Daniel |
dc.contributor.author | Tengattini, Andrea |
dc.contributor.author | Anopchenko, Aleksei |
dc.contributor.author | Ramírez Ramírez, Joan Manel |
dc.contributor.author | Rebled, J. M. (José Manuel) |
dc.contributor.author | Estradé Albiol, Sònia |
dc.contributor.author | Colonna, Jean-Philippe |
dc.contributor.author | Fedeli, Jean-Marc |
dc.contributor.author | Garrido Fernández, Blas |
dc.contributor.author | Pavesi, Lorenzo |
dc.date | 2013-01-10T12:48:39Z |
dc.date | 2013-01-10T12:48:39Z |
dc.date | 2012 |
dc.identifier.citation | 2159-3930 |
dc.identifier.uri | http://hdl.handle.net/2445/33305 |
dc.format | 8 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | The Optical Society |
dc.relation | info:eu-repo/semantics/altIdentifier/doi/10.1364/OME.2.001278 |
dc.relation | Reproducció del document publicat a: http://dx.doi.org/10.1364/OME.2.001278 |
dc.relation | Optical Materials Express, 2012, vol. 2, Issue 9, pp. 1278-1285 |
dc.relation | http://dx.doi.org/10.1364/OME.2.001278 |
dc.relation | info:eu-repo/grantAgreement/EC/FP7/224312/EU//HELIOS |
dc.rights | (c) The Optical Society (OSA), 2012 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Ciència dels materials |
dc.subject | Òptica |
dc.subject | Materials science |
dc.subject | Optics |
dc.title | Limit to the erbium ions emission in silicon-rich oxide films by erbium ion clustering |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.description.abstract |