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dc.contributor | Universitat de Barcelona |
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dc.contributor.author | Ferré Borrul, Josep |
dc.contributor.author | Duparré, Angela |
dc.contributor.author | Quesnel, Etienne |
dc.date | 2012-04-23T07:06:15Z |
dc.date | 2012-04-23T07:06:15Z |
dc.date | 2001 |
dc.identifier.citation | 0003-6935 |
dc.identifier.citation | 194023 |
dc.identifier.uri | http://hdl.handle.net/2445/24308 |
dc.format | 10 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Optical Society of America |
dc.relation | Reproducció del document publicat a: http://dx.doi.org/10.1364/AO.40.002190 |
dc.relation | Applied Optics, 2001, vol. 40, núm. 13, p. 2190-2199 |
dc.relation | http://dx.doi.org/10.1364/AO.40.002190 |
dc.rights | (c) Optical Society of America, 2001 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Òptica electrònica |
dc.subject | Electron optics |
dc.title | Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.description.abstract |