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Título:	Third harmonic generation at 223 nm in the metallic regime of GaP
Autor/a:	Roppo, Vito; Foreman, John V.; Akozbek, N; Vincenti, M. A.; Scalora, M.
Otros autores:	Universitat Politècnica de Catalunya. Departament de Física i Enginyeria Nuclear; Universitat Politècnica de Catalunya. DONLL - Dinàmica no Lineal, Òptica no Lineal i Làsers
Abstract:	We demonstrate second and third harmonic generation from a GaP substrate 500 μm thick. The second harmonic field is tuned at the absorption resonance at 335 nm, and the third harmonic signal is tuned at 223 nm, in a range where the dielectric function is negative. These results show that a phase locking mechanism that triggers transparency at the harmonic wavelengths persists regardless of the dispersive properties of the medium, and that the fields propagate hundreds of microns without being absorbed even when the harmonics are tuned to portions of the spectrum that display metallic behavior.
Abstract:	Peer Reviewed
Materia(s):	-Àrees temàtiques de la UPC::Física::Física de l'estat sòlid::Propietats òptiques -Harmonic generation and mixing -Harmònics (Ones elèctriques)
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Tipo de documento:	Artículo - Versión publicada Artículo
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