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dc.contributor | Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica |
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dc.contributor | Universitat Politècnica de Catalunya. HIPICS - Grup de Circuits i Sistemes Integrats d'Altes Prestacions |
dc.contributor.author | Gómez Fernández, Sergio |
dc.contributor.author | Moll Echeto, Francisco de Borja |
dc.date | 2010-12 |
dc.identifier.citation | Gómez, S.; Moll, F. Lithography aware regular cell design based on a predictive technology model. "Journal of low power electronics", Desembre 2010, vol. 6, núm. 4, p. 588-600. |
dc.identifier.citation | 1546-1998 |
dc.identifier.uri | http://hdl.handle.net/2117/11201 |
dc.language.iso | eng |
dc.relation | http://openurl.ingenta.com/content?genre=article&issn=1546-1998&volume=6&issue=4&spage=588&epage=600 |
dc.relation | info:eu-repo/grantAgreement/EC/FP7/248538/EU/SYNthesis using Advanced Process Technology Integrated in regular Cells, IPs, architectures, and design platforms/SYNAPTIC |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Àrees temàtiques de la UPC::Enginyeria electrònica::Electrònica de potència |
dc.subject | Design for Manufacturability |
dc.subject | DFM |
dc.subject | Lithography simulation |
dc.subject | Manufacturabilitat |
dc.title | Lithography aware regular cell design based on a predictive technology model |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.type | info:eu-repo/semantics/article |
dc.description.abstract | |
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