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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Andújar Bella, José Luis |
dc.contributor.author | Bertrán Serra, Enric |
dc.contributor.author | Polo Trasancos, Ma. del Carmen |
dc.date | 2012-05-08T07:27:20Z |
dc.date | 2012-05-08T07:27:20Z |
dc.date | 1998-03 |
dc.date | 2012-05-04T10:28:08Z |
dc.identifier.citation | 0734-2101 |
dc.identifier.citation | 131425 |
dc.identifier.uri | http://hdl.handle.net/2445/25046 |
dc.format | 9 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | American Institute of Physics |
dc.relation | Reproducció del document publicat a: http://dx.doi.org/10.1116/1.581097 |
dc.relation | Journal of Vacuum Science Technology A-Vacuum Surfaces and Films, 1998, vol. 16, num. 2, p. 578-586 |
dc.relation | http://dx.doi.org/10.1116/1.581097 |
dc.rights | (c) American Institute of Physics, 1998 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Nitrur de bor |
dc.subject | Pel·lícules fines |
dc.subject | Microelectrònica |
dc.subject | Electroquímica |
dc.subject | Boron nitride |
dc.subject | Thin films |
dc.subject | Microelectronics |
dc.subject | Electrochemistry |
dc.title | Plasma-enhanced chemical vapor deposition of boron nitride thin films from B2H6-H2-NH3 and B2H6-N2 gas mixtures |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.description.abstract |