Para acceder a los documentos con el texto completo, por favor, siga el siguiente enlace: http://hdl.handle.net/2445/24983
dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Andújar Bella, José Luis |
dc.contributor.author | Bertrán Serra, Enric |
dc.contributor.author | Canillas i Biosca, Adolf |
dc.contributor.author | Roch i Cunill, Carles |
dc.contributor.author | Morenza Gil, José Luis |
dc.date | 2012-05-07T08:17:26Z |
dc.date | 2012-05-07T08:17:26Z |
dc.date | 1987-03 |
dc.identifier.citation | 0734-2101 |
dc.identifier.citation | 58308 |
dc.identifier.uri | http://hdl.handle.net/2445/24983 |
dc.format | 6 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | American Institute of Physics |
dc.relation | Reproducció del document publicat a: http://dx.doi.org/10.1116/1.577253 |
dc.relation | Journal of Vacuum Science Technology A-Vacuum Surfaces and Films, 1991, vol. 9, num. 4, p. 2216-2221 |
dc.relation | http://dx.doi.org/10.1116/1.577253 |
dc.rights | (c) American Institute of Physics, 1991 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Radiofreqüència |
dc.subject | Pressió |
dc.subject | Pel·lícules fines |
dc.subject | Semiconductors amorfs |
dc.subject | Optoelectrònica |
dc.subject | Cèl·lules fotovoltaiques |
dc.subject | Radio frequency |
dc.subject | Pressure |
dc.subject | Thin films |
dc.subject | Amorphous semiconductors |
dc.subject | Optoelectronics |
dc.subject | Fotovoltaic cells |
dc.title | Influence of pressure and radio frequency power on deposition rate and structural properties of hydrogenated amorphous silicon thin films prepared by plasma deposition |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.description.abstract |