<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-04-14T06:40:26Z</responseDate><request verb="GetRecord" identifier="oai:www.recercat.cat:2445/140382" metadataPrefix="oai_dc">https://recercat.cat/oai/request</request><GetRecord><record><header><identifier>oai:recercat.cat:2445/140382</identifier><datestamp>2025-12-04T20:58:42Z</datestamp><setSpec>com_2072_1057</setSpec><setSpec>col_2072_478796</setSpec><setSpec>col_2072_478917</setSpec></header><metadata><oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
   <dc:title>Sono-electrodeposition transfer of micro-scale copper patterns on to A7 substrates using a mask-less method</dc:title>
   <dc:creator>Serrà i Ramos, Albert</dc:creator>
   <dc:creator>Coleman, Simon J.</dc:creator>
   <dc:creator>Gómez, Elvira</dc:creator>
   <dc:creator>Green, Todd A.</dc:creator>
   <dc:creator>Vallés Giménez, Elisa</dc:creator>
   <dc:creator>Vilana i Balastegui, Joan</dc:creator>
   <dc:creator>Roy, Sudipta</dc:creator>
   <dc:subject>Coure</dc:subject>
   <dc:subject>Galvanoplàstia</dc:subject>
   <dc:subject>Microestructura</dc:subject>
   <dc:subject>Copper</dc:subject>
   <dc:subject>Electroplating</dc:subject>
   <dc:subject>Microstructure</dc:subject>
   <dc:description>The EnFACE technology has been demonstrated as a successful mask-less electrodeposition method to transfer millimetre and micrometre-scale copper patterns on to A7-sized rectangular plates. This is the first successful demonstration of this technique using large substrates. A patterned anode tool was used to transfer electrodepositedpatterns onto anun-patterned cathode by maintaining very narrow separation (300 µm) between the two electrodes and agitating the fluid in the inter-electrode gap by ultrasonic means. A non-acidic copper solution with a low content of metal ions and additives was used.Limiting current experiments were initially performed to demonstrate that improved and uniform agitation could be maintained within the inter-electrode gap at relatively low ultrasonic powers of 5 to 30 W L-1. The best pattern definition was obtained at a US power of 5 W L-1and a current density of 20 mA cm-2. Importantly, the resultsobtained were comparable to those obtained by conventional through-mask plating. A single anode tool could be used to pattern up to five substrates, substantially minimising the amount of lithographic processingrequired. These results suggest that the EnFACE techniqueis a usefulmask-less microfabrication process for pattern transfer on to large substrates.</dc:description>
   <dc:date>2019-09-18T09:47:59Z</dc:date>
   <dc:date>2019-09-18T09:47:59Z</dc:date>
   <dc:date>2016-04-30</dc:date>
   <dc:date>2019-09-18T09:47:59Z</dc:date>
   <dc:type>info:eu-repo/semantics/article</dc:type>
   <dc:type>info:eu-repo/semantics/acceptedVersion</dc:type>
   <dc:identifier>0013-4686</dc:identifier>
   <dc:identifier>https://hdl.handle.net/2445/140382</dc:identifier>
   <dc:identifier>659251</dc:identifier>
   <dc:language>eng</dc:language>
   <dc:relation>Versió postprint del document publicat a: https://doi.org/10.1016/j.electacta.2016.04.003</dc:relation>
   <dc:relation>Electrochimica Acta, 2016, vol. 207, p. 207-217</dc:relation>
   <dc:relation>https://doi.org/10.1016/j.electacta.2016.04.003</dc:relation>
   <dc:rights>cc-by-nc-nd (c) Elsevier Ltd, 2016</dc:rights>
   <dc:rights>http://creativecommons.org/licenses/by-nc-nd/3.0/es</dc:rights>
   <dc:rights>info:eu-repo/semantics/openAccess</dc:rights>
   <dc:format>11 p.</dc:format>
   <dc:format>application/pdf</dc:format>
   <dc:publisher>Elsevier Ltd</dc:publisher>
   <dc:source>Articles publicats en revistes (Ciència dels Materials i Química Física)</dc:source>
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