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               <dc:title>Sono-electrodeposition transfer of micro-scale copper patterns on to A7 substrates using a mask-less method</dc:title>
               <dc:creator>Serrà i Ramos, Albert</dc:creator>
               <dc:creator>Coleman, Simon J.</dc:creator>
               <dc:creator>Gómez, Elvira</dc:creator>
               <dc:creator>Green, Todd A.</dc:creator>
               <dc:creator>Vallés Giménez, Elisa</dc:creator>
               <dc:creator>Vilana i Balastegui, Joan</dc:creator>
               <dc:creator>Roy, Sudipta</dc:creator>
               <dc:subject>Coure</dc:subject>
               <dc:subject>Galvanoplàstia</dc:subject>
               <dc:subject>Microestructura</dc:subject>
               <dc:subject>Copper</dc:subject>
               <dc:subject>Electroplating</dc:subject>
               <dc:subject>Microstructure</dc:subject>
               <dc:description>The EnFACE technology has been demonstrated as a successful mask-less electrodeposition method to transfer millimetre and micrometre-scale copper patterns on to A7-sized rectangular plates. This is the first successful demonstration of this technique using large substrates. A patterned anode tool was used to transfer electrodepositedpatterns onto anun-patterned cathode by maintaining very narrow separation (300 µm) between the two electrodes and agitating the fluid in the inter-electrode gap by ultrasonic means. A non-acidic copper solution with a low content of metal ions and additives was used.Limiting current experiments were initially performed to demonstrate that improved and uniform agitation could be maintained within the inter-electrode gap at relatively low ultrasonic powers of 5 to 30 W L-1. The best pattern definition was obtained at a US power of 5 W L-1and a current density of 20 mA cm-2. Importantly, the resultsobtained were comparable to those obtained by conventional through-mask plating. A single anode tool could be used to pattern up to five substrates, substantially minimising the amount of lithographic processingrequired. These results suggest that the EnFACE techniqueis a usefulmask-less microfabrication process for pattern transfer on to large substrates.</dc:description>
               <dc:date>2019-09-18T09:47:59Z</dc:date>
               <dc:date>2019-09-18T09:47:59Z</dc:date>
               <dc:date>2016-04-30</dc:date>
               <dc:date>2019-09-18T09:47:59Z</dc:date>
               <dc:type>info:eu-repo/semantics/article</dc:type>
               <dc:type>info:eu-repo/semantics/acceptedVersion</dc:type>
               <dc:relation>Versió postprint del document publicat a: https://doi.org/10.1016/j.electacta.2016.04.003</dc:relation>
               <dc:relation>Electrochimica Acta, 2016, vol. 207, p. 207-217</dc:relation>
               <dc:relation>https://doi.org/10.1016/j.electacta.2016.04.003</dc:relation>
               <dc:rights>cc-by-nc-nd (c) Elsevier Ltd, 2016</dc:rights>
               <dc:rights>http://creativecommons.org/licenses/by-nc-nd/3.0/es</dc:rights>
               <dc:rights>info:eu-repo/semantics/openAccess</dc:rights>
               <dc:publisher>Elsevier Ltd</dc:publisher>
               <dc:source>Articles publicats en revistes (Ciència dels Materials i Química Física)</dc:source>
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