<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-04-17T20:39:25Z</responseDate><request verb="GetRecord" identifier="oai:www.recercat.cat:2445/10634" metadataPrefix="oai_dc">https://recercat.cat/oai/request</request><GetRecord><record><header><identifier>oai:recercat.cat:2445/10634</identifier><datestamp>2025-12-04T21:31:47Z</datestamp><setSpec>com_2072_1057</setSpec><setSpec>col_2072_478812</setSpec><setSpec>col_2072_478917</setSpec></header><metadata><oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
   <dc:title>Excitable Er fraction and quenching phenomena in Er-doped SiO2 layers containing Si nanoclusters</dc:title>
   <dc:creator>Garrido Fernández, Blas</dc:creator>
   <dc:creator>García Favrot, Cristina</dc:creator>
   <dc:creator>Seo, S.-Y.</dc:creator>
   <dc:creator>Pellegrino, Paolo</dc:creator>
   <dc:creator>Navarro Urrios, Daniel</dc:creator>
   <dc:creator>Daldosso, Nicola</dc:creator>
   <dc:creator>Pavesi, Lorenzo</dc:creator>
   <dc:creator>Gourbilleau, Fabrice</dc:creator>
   <dc:creator>Rizk, Richard</dc:creator>
   <dc:subject>Materials nanoestructurats</dc:subject>
   <dc:subject>Propietats òptiques</dc:subject>
   <dc:subject>Matèria condensada</dc:subject>
   <dc:subject>Condensed matter</dc:subject>
   <dc:subject>Electronic structure of bulk materials</dc:subject>
   <dc:subject>Optical properties</dc:subject>
   <dc:description>This paper investigates the interaction between Si nanoclusters  Si-nc and Er in SiO2, reports on the optical&#xd;
characterization and modeling of this system, and attempts to clarify its effectiveness as a gain material for&#xd;
optical waveguide amplifiers at 1.54  m. Silicon-rich silicon oxide layers with an Er content of 4–6&#xd;
1020 at./cm3 were deposited by reactive magnetron sputtering. The films with Si excess of 6–7 at. %, and&#xd;
postannealed at 900 °C showed the best Er3+ photoluminescence  PL intensity and lifetime, and were used for&#xd;
the study. The annealing duration was varied up to 60 min to engineer the size and density of Si-nc and&#xd;
optimize Si-nc and Er coupling. PL investigations under resonant  488 nm and nonresonant  476 nm pumping&#xd;
show that an Er effective excitation cross section is similar to that of Si-nc  10−17–10−16 cm2 at low&#xd;
pumping flux  1016–1017 cm−2 s−1, while it drops at high flux  1018 cm−2 s−1. We found a maximum&#xd;
fraction of excited Er of about 2% of the total Er content. This is far from the 50% needed for optical&#xd;
transparency and achievement of population inversion and gain. Detrimental phenomena that cause depletion&#xd;
of Er inversion, such as cooperative up conversion, excited-stated absorption, and Auger deexcitations are&#xd;
modeled, and their impact in lowering the amount of excitable Er is found to be relatively small. Instead,&#xd;
Auger-type short-range energy transfer from Si-nc to Er is found, with a characteristic interaction length of&#xd;
0.4 nm. Based on such results, numerical and analytical  Er as a quasi-two-level system coupled rate equations&#xd;
have been developed to determine the optimum conditions for Er inversion. The modeling predicts that&#xd;
interaction is quenched for high photon flux and that only a small fraction of Er  0.2–2 % is excitable through&#xd;
Si-nc. Hence, the low density of sensitizers  Si-nc and the short range of the interaction are the explanation of&#xd;
the low fraction of Er coupled. Efficient ways to improve Er-doped Si-nc thin films for the realization of&#xd;
practical optical amplifiers are also discussed.</dc:description>
   <dc:date>2009-12-29T10:57:58Z</dc:date>
   <dc:date>2009-12-29T10:57:58Z</dc:date>
   <dc:date>2007</dc:date>
   <dc:type>info:eu-repo/semantics/article</dc:type>
   <dc:type>info:eu-repo/semantics/publishedVersion</dc:type>
   <dc:identifier>0163-1829</dc:identifier>
   <dc:identifier>https://hdl.handle.net/2445/10634</dc:identifier>
   <dc:identifier>564621</dc:identifier>
   <dc:language>eng</dc:language>
   <dc:relation>Reproducció digital del document publicat en format paper, proporcionada per PROLA i http://dx.doi.org/10.1103/PhysRevB.76.245308</dc:relation>
   <dc:relation>Physical Review B, 2007, vol. 76, núm. 24, p. 245308-1-245308-15</dc:relation>
   <dc:relation>http://dx.doi.org/10.1103/PhysRevB.76.245308</dc:relation>
   <dc:rights>(c) The American Physical Society, 2007</dc:rights>
   <dc:rights>info:eu-repo/semantics/openAccess</dc:rights>
   <dc:format>15 p.</dc:format>
   <dc:format>application/pdf</dc:format>
   <dc:publisher>The American Physical Society</dc:publisher>
   <dc:source>Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)</dc:source>
</oai_dc:dc></metadata></record></GetRecord></OAI-PMH>