<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-04-17T23:00:29Z</responseDate><request verb="GetRecord" identifier="oai:www.recercat.cat:2117/404515" metadataPrefix="oai_dc">https://recercat.cat/oai/request</request><GetRecord><record><header><identifier>oai:recercat.cat:2117/404515</identifier><datestamp>2026-03-09T03:49:10Z</datestamp><setSpec>com_2072_1033</setSpec><setSpec>col_2072_452950</setSpec></header><metadata><oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
   <dc:title>Impact of atomic layer deposition temperature on electrical and optical properties of ZnO:Al films</dc:title>
   <dc:creator>Masmitjà Rusiñol, Gerard</dc:creator>
   <dc:creator>Estarlich Gil, Pau</dc:creator>
   <dc:creator>López Rodríguez, Gema</dc:creator>
   <dc:creator>Martín García, Isidro</dc:creator>
   <dc:creator>Voz Sánchez, Cristóbal</dc:creator>
   <dc:creator>Placidi, Marcel Jose</dc:creator>
   <dc:creator>Torrens Dinarès, Arnau</dc:creator>
   <dc:creator>Saucedo Silva, Edgardo Ademar</dc:creator>
   <dc:creator>Vasquez, Pia</dc:creator>
   <dc:creator>Muñoz, Delfina</dc:creator>
   <dc:creator>Puigdollers i González, Joaquim</dc:creator>
   <dc:creator>Ortega Villasclaras, Pablo Rafael</dc:creator>
   <dc:contributor>Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica</dc:contributor>
   <dc:contributor>Universitat Politècnica de Catalunya. Departament d’Enginyeria Gràfica i de Disseny</dc:contributor>
   <dc:contributor>Universitat Politècnica de Catalunya. Doctorat en Enginyeria Electrònica</dc:contributor>
   <dc:contributor>Universitat Politècnica de Catalunya. MNT-Solar  - Grup de Micro i Nano Tecnologies per Energia Solar</dc:contributor>
   <dc:subject>Àrees temàtiques de la UPC::Enginyeria dels materials</dc:subject>
   <dc:subject>Zinc oxide----Optical properties</dc:subject>
   <dc:subject>Zinc oxide----Electric properties</dc:subject>
   <dc:subject>Photovoltaic power generation</dc:subject>
   <dc:subject>Atomic layer deposition</dc:subject>
   <dc:subject>Transparent conductive oxide</dc:subject>
   <dc:subject>Aluminum doped zinc oxide</dc:subject>
   <dc:subject>Òxid de zinc----Propietats òptiques</dc:subject>
   <dc:subject>Òxid de zinc----Propietats elèctriques</dc:subject>
   <dc:subject>Energia fotovoltaica--Generació</dc:subject>
   <dc:description>This work highlights the impact of growth temperature on electrical and optical properties of Al-doped ZnO (AZO) films deposited by atomic layer deposition (ALD) technique. The ALD process and super-cycle sequence have been optimized, identifying their influence on film resistivity. By using this optimum ALD procedure, the optical and electrical properties of AZO films have been widely analyzed considering the deposition temperature. Results show promising values with film resistivity in the range of 1 m¿cm and average optical absorption below 2% for 50 nm thick AZO layers. Hall effect, X-ray diffraction and ellipsometry measurements point out that these excellent values are related to their high carrier concentration and mobility, crystalline phase and optical band gap resulting in ALD AZO films with very good properties to be applied in photovoltaic devices as transparent conductive oxide electrode</dc:description>
   <dc:description>This work has been supported by the Spanish government under projects PID2019-109215RB-C41 (SCALED), PID2020-115719RB-C21 (GETPV), TED2021-131778B–C22 (TROPIC) and TED2021-129758B–C32 (TransEl) funded by MCIN/AEI/10.13039/501100011033. TROPIC and TransEl projects have also support from the European Union “NextGenerationEU”/PRTR program. This work has been developing under the FOTOCER project's guidelines, which is partially funded by CDTI and MICIN Spanish government through the European Union NextGeneration/PRTR program. G. M. acknowledges financial support of the Grant – UPC Margarita Salas 2021, of the Spanish Ministry of Universities and the European Unión – NextGenerationEU. The authors wish to express their thanks to Ivan Caño for his help about XRD measurements included in the supplementary information and carried out at the Centre de Recerca en Ciència i Enginyeria Multiescala de Barcelona (CRCEMB).</dc:description>
   <dc:description>Postprint (author's final draft)</dc:description>
   <dc:date>2024-03-01</dc:date>
   <dc:type>Article</dc:type>
   <dc:identifier>Masmitjà, G. [et al.]. Impact of atomic layer deposition temperature on electrical and optical properties of ZnO:Al films. "Journal of Science: Advanced Materials and Devices", 1 Març 2024, vol. 9, núm. 2.</dc:identifier>
   <dc:identifier>2468-2179</dc:identifier>
   <dc:identifier>https://hdl.handle.net/2117/404515</dc:identifier>
   <dc:identifier>10.1016/j.jsamd.2024.100698</dc:identifier>
   <dc:language>eng</dc:language>
   <dc:relation>https://www.sciencedirect.com/science/article/pii/S2468217924000297</dc:relation>
   <dc:relation>info:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2021-2023/PID2022-138434OB-C51/ES/INTEGRACION DE NUEVOS CONTACTOS SELECTIVOS Y CAPAS ACTIVAS EN DISPOSITIVOS DE NUEVA GENERACION PARA APLICACIONES DE ENERGIA RENOVABLE/</dc:relation>
   <dc:relation>info:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2017-2020/PID2020-115719RB-C21/ES/DISPOSITIVOS DE GERMANIO DE ALTA EFICIENCIA   PARA APLICACIONES TERMOFOTOVOLTAICAS DE BAJO COSTE/</dc:relation>
   <dc:relation>info:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2021-2023/TED2021-129758B-C32/ES/FUNCIONALIZACIÓN DE ELECTRODOS TRANSPARENTES EN ESTRUCTURAS HÍBRIDAS METAL-ÓXIDO CON CAPAS DIPOLARES PARA LA MEJORA DE CONTACTOS SELECTIVOS EN DISPOSITIVOS OPTOELECTRÓNICOS</dc:relation>
   <dc:relation>info:eu-repo/grantAgreement/AEI/Plan Estatal de Investigación Científica y Técnica y de Innovación 2021-2023/TED2021-131778B-C22/ES/DESARROLLO DE MATERIALES Y COMPONENTES PARA DISPOSITIVOS HÍBRIDOS TERMIÓNICO-FOTOVOLTAICOS</dc:relation>
   <dc:rights>http://creativecommons.org/licenses/by-nc-nd/4.0/</dc:rights>
   <dc:rights>Open Access</dc:rights>
   <dc:rights>Attribution-NonCommercial-NoDerivatives 4.0 International</dc:rights>
   <dc:format>application/pdf</dc:format>
   <dc:publisher>Elsevier</dc:publisher>
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