<?xml version="1.0" encoding="UTF-8"?><?xml-stylesheet type="text/xsl" href="static/style.xsl"?><OAI-PMH xmlns="http://www.openarchives.org/OAI/2.0/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/ http://www.openarchives.org/OAI/2.0/OAI-PMH.xsd"><responseDate>2026-04-17T22:54:24Z</responseDate><request verb="GetRecord" identifier="oai:www.recercat.cat:2117/16705" metadataPrefix="oai_dc">https://recercat.cat/oai/request</request><GetRecord><record><header><identifier>oai:recercat.cat:2117/16705</identifier><datestamp>2026-02-06T03:55:33Z</datestamp><setSpec>com_2072_1033</setSpec><setSpec>col_2072_452950</setSpec></header><metadata><oai_dc:dc xmlns:oai_dc="http://www.openarchives.org/OAI/2.0/oai_dc/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:doc="http://www.lyncode.com/xoai" xsi:schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd">
   <dc:title>Optical absorption of radio frequency sputtered GaAs(Ti) films</dc:title>
   <dc:creator>Boronat, A</dc:creator>
   <dc:creator>Silvestre Bergés, Santiago</dc:creator>
   <dc:creator>Fuertes Marrón, D.</dc:creator>
   <dc:creator>Castañer Muñoz, Luis María</dc:creator>
   <dc:creator>Martí, A.</dc:creator>
   <dc:creator>Luque, Antonio</dc:creator>
   <dc:contributor>Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica</dc:contributor>
   <dc:contributor>Universitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies</dc:contributor>
   <dc:subject>Àrees temàtiques de la UPC::Enginyeria electrònica::Microelectrònica</dc:subject>
   <dc:subject>Àrees temàtiques de la UPC::Enginyeria dels materials</dc:subject>
   <dc:subject>Materials--Electric properties</dc:subject>
   <dc:subject>Materials--Propietats elèctriques</dc:subject>
   <dc:description>Composition and optical absorption of thin films&#xd;
of GaAs(Ti) and GaAs, deposited by sputtering on glass&#xd;
substrates under different process conditions, have been&#xd;
investigated. The thin films obtained are typically 200 nm&#xd;
thick. ToF–SIMS measurements show a quite constant&#xd;
concentration and good uniformity of Ti profiles along the&#xd;
GaAs(Ti) layers in all cases and EPMA results indicate that&#xd;
Ti content increases with the substrate temperature in the&#xd;
sputtering process. Measurements of the transmittance and&#xd;
reflectance spectra of the GaAs and GaAs(Ti) thin films have&#xd;
been carried out. In the optical characterization of the films it&#xd;
is found that optical absorption is enhanced in all samples&#xd;
containing Ti. The determination of the optical gap from the&#xd;
optical absorption, shows optical gap variations from 1.15 to&#xd;
1.29 eV in the GaAs thin films, and from 0.83 to 1.13 eV in&#xd;
the GaAs(Ti) thin films. The differences in absorption and&#xd;
EgTAUC observed between samples of GaAs and GaAs(Ti)&#xd;
are consistent with the presence of an intermediate band.</dc:description>
   <dc:description>Peer Reviewed</dc:description>
   <dc:description>Postprint (published version)</dc:description>
   <dc:date>2012-08-14</dc:date>
   <dc:type>Article</dc:type>
   <dc:identifier>Boronat, A. [et al.]. Optical absorption of radio frequency sputtered GaAs(Ti) films. "Journal of materials science. Materials in electronics", 14 Agost 2012, vol. on line, núm. on line, p. 1-6.</dc:identifier>
   <dc:identifier>0957-4522</dc:identifier>
   <dc:identifier>https://hdl.handle.net/2117/16705</dc:identifier>
   <dc:identifier>10.1007/s10854-012-0864-9</dc:identifier>
   <dc:language>eng</dc:language>
   <dc:relation>http://www.springerlink.com/content/6j166q253676668j/</dc:relation>
   <dc:rights>Restricted access - publisher's policy</dc:rights>
   <dc:format>6 p.</dc:format>
   <dc:format>application/pdf</dc:format>
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