2026-04-17T05:37:03Zhttps://recercat.cat/oai/request

oai:recercat.cat:10256/85752024-06-14T09:37:19Zcom_2072_452955com_2072_2054col_2072_453063

Molecular hydrogen diffusion in nanostructured amorphous silicon thin films Kail, Fatiha Farjas Silva, Jordi Roura Grabulosa, Pere Hidrogenació Hydrogenation Silici Silicon Materials nanoestructurals Nanostructure materials Thin films Capes fines We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data 2009 info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion http://hdl.handle.net/10256/8575 http://hdl.handle.net/10256/8575 eng info:eu-repo/semantics/altIdentifier/doi/10.1103/PhysRevB.80.073202 info:eu-repo/semantics/altIdentifier/issn/1098-0121 info:eu-repo/semantics/altIdentifier/eissn/1550-235X Tots els drets reservats info:eu-repo/semantics/openAccess application/pdf American Physical Society © Physical Review B, 2009, vol. 80, núm. 7, p. 073202 Articles publicats (D-F)