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dc.contributor.author | Das, Debabrata |
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dc.contributor.author | Farjas Silva, Jordi |
dc.contributor.author | Roura Grabulosa, Pere |
dc.contributor.author | Viera Mármol, Gregorio |
dc.contributor.author | Bertrán Serra, Enric |
dc.date | 2001-11 |
dc.date.accessioned | 2010-11-07T06:16:18Z |
dc.date.available | 2010-11-07T06:16:18Z |
dc.date.issued | 2010-11-07T06:16:18Z |
dc.identifier.citation | Das, D., Farjas, J., Roura, P., Viera, G., i Bertran, E. (2001). Enhancement of oxidation rate of a-Si nanoparticles during dehydrogenation. Applied Physics Letters, 79 (22), 3705 - 3707. Recuperat 28 setembre 2010, a http://apl.aip.org/resource/1/applab/v79/i22/p3705_s1 |
dc.identifier.citation | 0003-6951 |
dc.identifier.citation | http://dx.doi.org/10.1063/1.1420533 |
dc.identifier.uri | http://hdl.handle.net/10256/3051 |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | American Institute of Physics |
dc.relation | Reproducció digital del document publicat a: http://dx.doi.org/10.1063/1.1420533 |
dc.relation | © Applied Physics Letters, 2001, vol. 79, núm. 22, p. 3705-3707 |
dc.relation | Articles publicats (D-F) |
dc.rights | Tots els drets reservats |
dc.subject | Anàlisi tèrmica |
dc.subject | Hidrogenació |
dc.subject | Semiconductors amorfs |
dc.subject | Silici -- Oxidació |
dc.subject | Materials nanoestructurals |
dc.subject | Amorphous semiconductors |
dc.subject | Hydrogenation |
dc.subject | Nanostructure materials |
dc.subject | Silicon -- Oxidation |
dc.subject | Thermal analysis |
dc.title | Enhancement of oxidation rate of a-Si nanoparticles during dehydrogenation |
dc.type | info:eu-repo/semantics/article |
dc.description.abstract |