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dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Cifre, J. |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Puigdollers i González, Joaquim |
dc.contributor.author | Polo Trasancos, Ma. del Carmen |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.contributor.author | Lloret, A. |
dc.date | 2016-05-23T13:48:11Z |
dc.date | 2016-05-23T13:48:11Z |
dc.date | 1994 |
dc.date | 2016-05-11T14:36:48Z |
dc.identifier.citation | 0947-8396 |
dc.identifier.citation | 114374 |
dc.identifier.uri | http://hdl.handle.net/2445/98753 |
dc.format | 7 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Springer Verlag |
dc.relation | Versió postprint del document publicat a: http://dx.doi.org/10.1007/BF00331926 |
dc.relation | Applied Physics A: Materials Science and Processing , 1994, vol. 59, num. 6, p. 645-651 |
dc.relation | http://dx.doi.org/10.1007/BF00331926 |
dc.rights | (c) Springer Verlag, 1994 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Pel·lícules fines |
dc.subject | Silici |
dc.subject | Deposició en fase de vapor |
dc.subject | Thin films |
dc.subject | Silicon |
dc.subject | Vapor-plating |
dc.title | Polycrystalline silicon films obtained by hot-wire chemical vapour deposition |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/acceptedVersion |
dc.description.abstract |