Per accedir als documents amb el text complet, si us plau, seguiu el següent enllaç: http://hdl.handle.net/2445/47377
dc.contributor | Universitat de Barcelona |
---|---|
dc.contributor.author | Voz Sánchez, Cristóbal |
dc.contributor.author | Martin Garcia, Isidro |
dc.contributor.author | Orpella, Albert |
dc.contributor.author | Puigdollers i González, Joaquim |
dc.contributor.author | Vetter, M. |
dc.contributor.author | Alcubilla González, Ramón |
dc.contributor.author | Soler Vilamitjana, David |
dc.contributor.author | Fonrodona Turon, Marta |
dc.contributor.author | Bertomeu i Balagueró, Joan |
dc.contributor.author | Andreu i Batallé, Jordi |
dc.date | 2013-10-29T14:37:04Z |
dc.date | 2013-10-29T14:37:04Z |
dc.date | 2003 |
dc.date | 2013-10-29T14:37:04Z |
dc.identifier.citation | 0040-6090 |
dc.identifier.citation | 507391 |
dc.identifier.uri | http://hdl.handle.net/2445/47377 |
dc.format | 13 p. |
dc.format | application/pdf |
dc.language.iso | eng |
dc.publisher | Elsevier B.V. |
dc.relation | Versió postprint del document publicat a: http://dx.doi.org/10.1016/S0040-6090(03)00130-5 |
dc.relation | Thin Solid Films, 2003, vol. 430, num. 1-2, p. 270-273 |
dc.relation | http://dx.doi.org/10.1016/S0040-6090(03)00130-5 |
dc.rights | (c) Elsevier B.V., 2003 |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Cèl·lules solars |
dc.subject | Catàlisi |
dc.subject | Deposició química en fase vapor |
dc.subject | Metal·lúrgia |
dc.subject | Silici |
dc.subject | Pel·lícules fines |
dc.subject | Solar cells |
dc.subject | Catalysis |
dc.subject | Chemical vapor deposition |
dc.subject | Metallurgy |
dc.subject | Silicon |
dc.subject | Thin films |
dc.title | Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films |
dc.type | info:eu-repo/semantics/article |
dc.type | info:eu-repo/semantics/acceptedVersion |
dc.description.abstract |