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Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm
Ferré Borrull, Josep; Duparré, Angela; Quesnel, Etienne
Universitat de Barcelona
Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.
Dispersió de la llum
Òptica electrònica
Light scattering
Electron optics
(c) Optical Society of America, 2000
Optical Society of America

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