Cracks tamed

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Title:	Cracks tamed
Author:	Pons Rivero, Antonio Javier
Other authors:	Universitat Politècnica de Catalunya. Departament de Física i Enginyeria Nuclear; Universitat Politècnica de Catalunya. DONLL - Dinàmica no Lineal, Òptica no Lineal i Làsers
Abstract:	Crack propagation in materials is rarely welcome. But carefully engineered cracks produced during the deposition of a film on silicon can be used to efficiently create pre-designed patterns of nanometre-scale channels.
Abstract:	Peer Reviewed
Subject(s):	-Àrees temàtiques de la UPC::Enginyeria dels materials::Assaig de materials -Fracture mechanics -Fractures, Mecànica de
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Document type:	Article - Published version Article
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