Title:
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Cracks tamed
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Author:
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Pons Rivero, Antonio Javier
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Other authors:
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Universitat Politècnica de Catalunya. Departament de Física i Enginyeria Nuclear; Universitat Politècnica de Catalunya. DONLL - Dinàmica no Lineal, Òptica no Lineal i Làsers |
Abstract:
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Crack propagation in materials is rarely welcome. But carefully engineered cracks produced during the deposition of a film on silicon can be used to efficiently create pre-designed patterns of nanometre-scale channels. |
Abstract:
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Peer Reviewed |
Subject(s):
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-Àrees temàtiques de la UPC::Enginyeria dels materials::Assaig de materials -Fracture mechanics -Fractures, Mecànica de |
Rights:
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Document type:
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Article - Published version Article |
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