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dc.contributor | Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica |
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dc.contributor | Universitat Politècnica de Catalunya. HIPICS - Grup de Circuits i Sistemes Integrats d'Altes Prestacions |
dc.contributor.author | Gómez Fernández, Sergio |
dc.contributor.author | Moll Echeto, Francisco de Borja |
dc.date | 2010 |
dc.identifier.citation | Gómez, S.; Moll, F. Lithography aware regular cell design based on a predictive technology model. A: European workshop on CMOS Variability. "The 1st European workshop on CMOS Variability". Montpellier: 2010. |
dc.identifier.uri | http://hdl.handle.net/2117/10393 |
dc.language.iso | eng |
dc.relation | info:eu-repo/grantAgreement/EC/FP7/248538/EU/SYNthesis using Advanced Process Technology Integrated in regular Cells, IPs, architectures, and design platforms/SYNAPTIC |
dc.rights | info:eu-repo/semantics/openAccess |
dc.subject | Àrees temàtiques de la UPC::Enginyeria electrònica |
dc.subject | Metal oxide semiconductors, Complementary |
dc.subject | Electronics |
dc.subject | Integrated circuit layout |
dc.subject | Electrònica |
dc.title | Lithography aware regular cell design based on a predictive technology model |
dc.type | info:eu-repo/semantics/publishedVersion |
dc.type | info:eu-repo/semantics/conferenceObject |
dc.description.abstract |