To access the full text documents, please follow this link: http://hdl.handle.net/2445/24984

Computer-aided procedure for optimization of layer thickness uniformity in thermal evaporation physical vapor deposition chambers for lens coating
Bosch i Puig, Salvador
Universitat de Barcelona
A computer-aided method to improve the thickness uniformity attainable when coating multiple substrates inside a thermal evaporation physical vapor deposition unit is presented. The study is developed for the classical spherical (dome-shaped) calotte and also for a plane sector reversible holder setup. This second arrangement is very useful for coating both sides of the substrate, such as antireflection multilayers on lenses. The design of static correcting shutters for both kinds of configurations is also discussed. Some results of using the method are presented as an illustration.
Disseny assistit per ordinador
Pel·lícules fines
Filtres òptics
Lents
Computer-aided design
Thin films
Light filters
Lenses
(c) American Institute of Physics, 1992
Article
American Institute of Physics
         

Show full item record

Related documents

Other documents of the same author

Carcolé i Carrubé, Eduard; Bosch i Puig, Salvador; Campos Coloma, Juan
Vallmitjana i Rico, Santiago; Bosch i Puig, Salvador; Juvells Prades, Ignacio; Ros Puig, Domènec
Wolf, T.; Gutmann, B.; Weber, H.; Ferré Borrull, Josep; Bosch i Puig, Salvador; Vallmitjana i Rico, Santiago
Bosch i Puig, Salvador; Pérez Tudela, Julio D.; Canillas i Biosca, Adolf
Ristau, Detlev; Günster, Stefan; Bosch i Puig, Salvador; Duparré, Angela; Masetti, Enrico; Ferré Borrull, Josep; Kiriakidis, George; Peiró Martínez, Francisca; Quesnel, Etienne; Tihhonravov, Alexander
 

Coordination

 

Supporters