Title:
|
Computer-aided procedure for optimization of layer thickness uniformity in thermal evaporation physical vapor deposition chambers for lens coating; info:eu-repo/semantics/publishedVersion
|
Author:
|
Bosch i Puig, Salvador
|
Other authors:
|
Universitat de Barcelona |
Abstract:
|
A computer-aided method to improve the thickness uniformity attainable when coating multiple substrates inside a thermal evaporation physical vapor deposition unit is presented. The study is developed for the classical spherical (dome-shaped) calotte and also for a plane sector reversible holder setup. This second arrangement is very useful for coating both sides of the substrate, such as antireflection multilayers on lenses. The design of static correcting shutters for both kinds of configurations is also discussed. Some results of using the method are presented as an illustration. |
Subject(s):
|
-Disseny assistit per ordinador -Pel·lícules fines -Filtres òptics -Lents -Computer-aided design -Thin films -Light filters -Lenses |
Rights:
|
(c) American Institute of Physics, 1992
|
Document type:
|
Article |
Published by:
|
American Institute of Physics
|
Share:
|
|