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Influence of pressure and radio frequency power on deposition rate and structural properties of hydrogenated amorphous silicon thin films prepared by plasma deposition
Andújar Bella, José Luis; Bertrán Serra, Enric; Canillas i Biosca, Adolf; Roch i Cunill, Carles; Morenza Gil, José Luis
Universitat de Barcelona
2012-05-07
Radiofreqüència
Pressió
Pel·lícules fines
Semiconductors amorfs
Optoelectrònica
Cèl·lules fotovoltaiques
Radio frequency
Pressure
Thin films
Amorphous semiconductors
Optoelectronics
Fotovoltaic cells
(c) American Institute of Physics 1991
Article
American Institute of Physics
         

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