To access the full text documents, please follow this link: http://hdl.handle.net/10256/3297

Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments
Kail, Fatiha; Farjas Silva, Jordi; Roura Grabulosa, Pere; Secouard, Christopher; Nos, Oriol; Bertomeu, Joan Prat; Alzina, F.; Roca i Cabarrocas, Pere
Amorphous semiconductors
Espectroscòpia Raman
Hidrogenació
Semiconductors amorfs
Silici
Hydrogenation
Raman spectroscopy
Tots els drets reservats
Article
info:eu-repo/semantics/publishedVersion
American Institute of Physics
         

Show full item record

Related documents

Other documents of the same author

Rath, Chandana; Farjas Silva, Jordi; Roura Grabulosa, Pere; Kail, Fatiha; Roca i Cabarrocas, Pere; Bertrán Serra, Enric
Roura Grabulosa, Pere; Farjas Silva, Jordi; Rath, Chandana; Serra-Miralles, J.; Bertrán Serra, Enric; Roca i Cabarrocas, Pere
Roura Grabulosa, Pere; Taïr, Fadila; Farjas Silva, Jordi; Roca i Cabarrocas, Pere
 

Coordination

 

Supporters