Calorimetry of hydrogen desorption from a-Si nanoparticles

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Título:	Calorimetry of hydrogen desorption from a-Si nanoparticles
Autor/a:	Farjas Silva, Jordi; Das, D.; Fort, J.; Roura Grabulosa, Pere; Bertrán Serra, Enric
Otros autores:	Universitat de Barcelona
Abstract:	The process of hydrogen desorption from amorphous silicon (a-Si) nanoparticles grown by plasma-enhanced chemical vapor deposition (PECVD) has been analyzed by differential scanning calorimetry (DSC), mass spectrometry, and infrared spectroscopy, with the aim of quantifying the energy exchanged. Two exothermic peaks centered at 330 and 410 C have been detected with energies per H atom of about 50 meV. This value has been compared with the results of theoretical calculations and is found to agree with the dissociation energy of Si-H groups of about 3.25 eV per H atom, provided that the formation energy per dangling bond in a-Si is about 1.15 eV. It is shown that this result is valid for a-Si:H films, too.
Materia(s):	-Ciència dels materials -Semiconductors amorfs -Pel·lícules fines -Structure of solids and liquids -Materials science -Surfaces and interfaces -Thin films
Derechos:	(c) The American Physical Society, 2002
Tipo de documento:	Artículo Artículo - Versión publicada
Editor:	The American Physical Society
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Roura Grabulosa, Pere; Farjas Silva, Jordi; Rath, Chandana; Serra-Miralles, J.; Bertrán Serra, Enric; Roca i Cabarrocas, Pere

Farjas Silva, Jordi; Rath, Chandana; Pinyol i Agelet, Albert; Roura Grabulosa, Pere; Bertrán Serra, Enric

Rath, Chandana; Farjas Silva, Jordi; Roura Grabulosa, Pere; Kail, Fatiha; Roca i Cabarrocas, Pere; Bertrán Serra, Enric

Das, Debabrata; Farjas Silva, Jordi; Roura Grabulosa, Pere; Viera Mármol, Gregorio; Bertrán Serra, Enric

Farjas Silva, Jordi; Das, Debabrata; Fort, Joaquim; Roura Grabulosa, Pere; Bertrán Serra, Enric

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