To access the full text documents, please follow this link: http://hdl.handle.net/2445/99362
Title: | Crystal growth characterization of polycrystalline silicon films obtained by hot-wire chemical vapour deposition |
---|---|
Author: | Polo Trasancos, Ma. del Carmen; Peiró Martínez, Francisca; Cifre, J.; Bertomeu i Balagueró, Joan; Puigdollers i González, Joaquim; Andreu i Batallé, Jordi |
Other authors: | Universitat de Barcelona |
Abstract: | |
Subject(s): | -Silici -Deposició química en fase vapor -Pel·lícules fines -Creixement cristal·lí -Silicon -Chemical vapor deposition -Thin films -Crystal growth |
Rights: | cc-by (c) Polo Trasancos, Ma. del Carmen et al., 1995
http://creativecommons.org/licenses/by/3.0/es |
Document type: | Article Article - Published version |
Published by: | Institute of Physics (IOP) |
Share: |