A novel photolithographic technique which promises quick and easy large area patterning is explored to satisfy the nanowire applications requirements. Nanohole patterns for ordered nanowire growth and nanopillar arrays for PV applications are produced by means of Near Field Phase-Shift Photolithography. Furthermore, solar cells based on silicon nanopillars have been fabricated showing high e ciencies. The quality of di erent passivating materials was evaluated in this particular approach, concluding that a double layer of SiO2/SiNx is the most appropriate.

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