Title:
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Improvement of crystalline silicon surface passivation by hidrogen plasma treatment
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Author:
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Martín García, Isidro; Vetter, Michael; Orpella García, Alberto; Voz Sánchez, Cristóbal; Puigdollers i González, Joaquim; Alcubilla González, Ramón; Kharchenko, A.V.; Roca i Cabarrocas, Pere
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Other authors:
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Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica; Universitat Politècnica de Catalunya. MNT - Grup de Recerca en Micro i Nanotecnologies |
Abstract:
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A completely dry low-temperature process has been developed to passivate 3.3 Ωcm p-type
crystalline silicon surface with excellent results. Particularly, we have investigated the use of a
hydrogen plasma treatment, just before hydrogenated amorphous silicon carbide (a-SiCx:H)
deposition, without breaking the vacuum. We measured effective lifetime, Τ eff , through a
quasi-steady-state photoconductance technique. Experimental results show that hydrogen plasma
treatment improves surface passivation compared to classical HF dip. Seff values lower than 19
cm s -1 were achieved using a hydrogen plasma treatment and an a-SiCx:H film deposited at 300°C. |
Abstract:
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Peer Reviewed |
Subject(s):
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-Àrees temàtiques de la UPC::Enginyeria electrònica::Microelectrònica -Microelectronics. -Silicon. -Crystalline silicon surface passivation -Dry low-temperature process -Effective lifetime -Elemental semiconductors -Etching -Hydrogen plasma treatment -Hydrogenated amorphous silicon carbide -p-type crystalline silicon surface -Passivation -Plasma materials processing -Quasisteady state photoconductance -Silicon compounds -Wide band gap semiconductors -Silici -Microelectrònica |
Rights:
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Document type:
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Article |
Published by:
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American Institute of Physics
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